한국해양대학교

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HVPE법에 의한 Si 기판 위의 질화물 반도체 성장에 관한 연구

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dc.contributor.author 이충현 -
dc.date.accessioned 2017-02-22T02:22:07Z -
dc.date.available 2017-02-22T02:22:07Z -
dc.date.issued 2009 -
dc.date.submitted 2009-01-15 -
dc.identifier.uri http://kmou.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000002174291 ko_KR
dc.identifier.uri http://repository.kmou.ac.kr/handle/2014.oak/8285 -
dc.description.abstract III-V nitrides compound semiconductors have attracted much attention because of their applications in blue/UV optoelectronic devices high power and high temperature electronic devices. Indium gallium nitride(InGaN), in particular, is a promising material for the fabrication of optical devices emitting photons from 0.7 eV to 3.4 eV. Especially, for a nano or micro-scale sized structures, the indium gallium nitride ternary alloys are expected to show novel optical characteristics by reduced density of states and improved carrier confinement. GaN-based devices such as light emitting diodes (LED) are usually grown on sapphire or SiC substrates. Compared to sapphire and SiC, Si substrates offer the advantages of low cost, large-scale availability, good thermal and electrical conductivities, top-down electrode formation and the feasibility of removing the Si substrate with wet etching. In this paper, the growth of GaN-based compound semiconductors has been attempted on Si substrate in experiment of three types First of all, the thickness GaN layers are grown on GaN(1-101) template by hydride vapor phase epitaxy(HVPE). The GaN(1-101) template was selectively grown on a 8-degree off-oriented (001) patterned Si substrate by metalorganic chemical vapor deposition(MOCVD). The grown morphology of GaN layers are investigated by scanning electron microscopy(SEM) and cathodoluminescence(CL). Secondly, the structural change of InGaN quantum sized structures on Si substrate grown by mixed-source HVPE. The grown InGaN structures are analyzed by X-ray photoelectron spectroscopy(XPS) to characterize the InGaN ternary crystal alloy. Finally, the SAG(selective area growth)-LEDs are grown on GaN/Si(111) substrate by mixed-source HVPE. AlGaN and InAlGaN are used as active layers. The GaN template layer on Si(111) substrate is grown by MOCVD and the SAG-double-hetero(DH) structures are grown by HVPE with multi sliding boat system. The grown SAG-LEDs are characterized by SEM, current-voltage(I-V) measurement and electroluminescence(EL). -
dc.description.tableofcontents I. 서론 = 1 1. 질화물 반도체의 성장 방법 = 4 2. 연구의 필요성 = 6 II. 본론 = 9 1. Si 기판 위의 후막 (1-101) GaN 결정 성장 = 9 1.1 개요 = 9 1.2 8°-off Si (100) 기판 위의 GaN template 제작 = 10 1.2.1 8°-off Si (100) 기판의 에칭 조건 확립 = 10 1.2.2 MOCVD에 의한 8°-off Si(100) 기판 위의 GaN template 제작 = 12 1.2.3 HVPE에 의한 후막 (1-101) GaN 결정 성장 = 13 1.3 결론 = 17 2. Si 기판 위의 InGaN 마이크로 구조의 상변화 = 18 2.1 개요 = 18 2.2 혼합소스 HVPE법 = 19 2.3 InGaN 마이크로 구조물 제작 = 21 2.4 성장된 InGaN 마이크로 구조물의 특성 = 22 2.5 결론 = 29 3. Si(111) 기판 위의 LED = 31 3.1 개요 = 31 3.2 Multi-sliding boat system = 33 3.3 Si 기판 위의 LED 제작 = 35 3.4 Si 기판위에 성장된 HVPE LED 특성 = 42 3.5 결론 = 46 III. 결론 = 48 참고문헌 = 53 -
dc.language kor -
dc.publisher 한국해양대학교 대학원 -
dc.title HVPE법에 의한 Si 기판 위의 질화물 반도체 성장에 관한 연구 -
dc.title.alternative Study on the growth of III-nitride semiconductors on Si substrates by HVPE -
dc.type Thesis -
dc.date.awarded 2009-02 -
dc.contributor.alternativeName Lee -
dc.contributor.alternativeName Chung Hyun -
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