한국해양대학교

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다 대역 스펙트럼을 방출하는 백색 LED 응용을 위한 혼합 소스 HVPE-III-nitride 물질의 연구

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dc.contributor.author 황선령 -
dc.date.accessioned 2017-02-22T05:56:42Z -
dc.date.available 2017-02-22T05:56:42Z -
dc.date.issued 2008 -
dc.date.submitted 56879-03-02 -
dc.identifier.uri http://kmou.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000002174751 ko_KR
dc.identifier.uri http://repository.kmou.ac.kr/handle/2014.oak/8839 -
dc.description.abstract The purpose of this study is to explore the possibility of phosphor-free white-emitting LED?s based in the gallium nitride material system. The structures are to be grown using mixed source hydride vapor phase epitaxy (MS-HVPE). It is unique crystal growth technology different from conventional HVPE and MOCVD system using mixed metal source of aluminum, indium and gallium. The first step in this project is the optimization of MS-HVPE growth process. This was achieved successfully, as binary, ternary and quaternary films are demonstrated. Successful n and p-type doping are also demonstrated introducing Te and Mg. The second step in this project is fabricating broadband spectrum emitting device of phosphor-free white LED by MS-HVPE. The device structure consisted of conventional double-hetero (DH) structure, which was the undoped InAlGaN active layer and n, p-AlGaN cladding layers. We observed that the device of AlInGaN quarternary active grown by MS-HVPE emitted multi spectrum from UV to red area. We also found that its spectrum was variable as indium mole fraction and controllable. It was nano phase epitaxy phenomenon being only observed in HS-HVPE process. An extensive growth study of GaN based material was also carried out. The effects of several growth parameters on emission characteristics were presented. PL emission wavelengths for each structure were demonstrated. And EL emission wavelengths were also demonstrated after wafer fabrication process. Additionally, x-ray diffraction and x-ray photoelectron spectroscopy (XPS) showed to verify crystal quality of MS-HVPE. The dissertation presented herein demonstrates achieving phosphor-free solid-state white lighting. But it still has unknown physical characteristics. Continuation of this study will lead to future industry. And hopefully it will be commercialized and applied to residential illumination due to this technology. -
dc.description.tableofcontents Chapter 1. Introduction 1 1.1. Overview of LED 1 1.2. Wide bandgap compound semiconductor 6 1.3. Overview of white LED 10 1.4. Purpose and outline of this project 15 Chapter 2. Fundamentals of Gallium Nitride 21 2.1. Introduction 21 2.1.1. Current Issues in GaN-based LED 23 2.2. Crystallography of Gallium Nitride 26 2.3. Characteristics of Gallium Nitride 32 2.3.1. Doping of Gallium Nitride 33 2.3.2. Optical Properties of Gallium Nitride 35 2.3.3. Polarity in Gallium Nitride 38 2.4. Substrates for GaN Epitxial Growth 40 2.4.1. Substrate issues 40 2.4.2. Sapphire 41 2.4.3. SiC 45 Chapter 3. Overview of Epitaxial Growth Experimental 57 3.1. Hydride vapor phase epitaxy 57 3.1.1. Introduction to HVPE 57 3.1.2. Mixed source HVPE system 59 3.1.3. Some parameters for optimized GaN growth 62 3.2. Wafer fabrication process 63 3.2.1. Selective area growth 63 3.2.2.Metallization of GaN 64 3.3. Measurements 66 3.3.1. Photoluminescence 66 3.3.2. DXRD 67 3.3.3. SEM/CL 70 3.3.4. E-CV 75 3.3.5. Hall measurement 77 Chapter 4. Mixed Source HVPE Growth Experiment for Bulk Characteristics 82 4.1. GaN growth 82 4.1.1 Buffer growth for GaN layer 83 4.1.2. Mg-doped GaN layer 87 4.2. AlGaN growth 90 4.3. InGaN growth 97 Chapter 5. Fabrication of AlInGaN-Based LED for White Emission 115 5.1. AlInGaN SAG-DH structure growth 115 5.2. Characterization of AlInGaN SAG-DH epitaxial structure 123 5.3. Device fabrication 127 Chapter 6. Experimental Results for Active layer’s Condition 135 6.1. Performance of AlInGaN white LED 136 6.2. EL characteristics of AlGaN and AlInGaN active 139 6.2.1 GaN active layer 139 6.2.2 Al(0.1g)GaN active layer 141 6.2.3 Al(0.3g)GaN active layer 144 6.2.4 Al(0.4g)GaN active layer 144 6.2.5 Al(0.5g)GaN active layer 146 6.2.6 Al(0.6g)GaN active layer 149 6.2.7 In(0.1g) Al(0.6g) GaN active layer 151 6.2.8 In(0.2g)Al(0.6g)GaN active layer 153 6.2.9 In(0.3g)Al(0.6g)GaN active layer 155 6.2.10 In(0.4g)Al(0.6g)GaN active layer 158 6.2.11 In(0.5g)Al(0.6g)GaN active layer 160 6.3. XRD characteristics 163 Chapter 7. Phosphor &#8211 -
dc.description.tableofcontents Free White LED Lamp 180 7.1. Manufacturing of white LED lamp 180 7.2. Analysis of White LED Spectra and Color Rendering 181 7.3. Measurement of Phospohor free white LED 189 7.4. Future research 197 Chapter 8. Conclusions 200 Publications 202 Conference 204 Biography 209 Acknowledgements 210 -
dc.language eng -
dc.publisher 한국해양대학교 대학원 -
dc.title 다 대역 스펙트럼을 방출하는 백색 LED 응용을 위한 혼합 소스 HVPE-III-nitride 물질의 연구 -
dc.title.alternative Study of the III-nitride materials grown by mixed-source HVPE for white LED applications emitting multi spectrum range -
dc.type Thesis -
dc.date.awarded 2008-08 -
dc.contributor.alternativeName Sun-Lyeong Hwang -
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응용과학과 > Thesis
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